FERNANDES, S. F. L.; http://lattes.cnpq.br/8598484164048317; FERNANDES, Stênio Flávio de Lacerda.
Resumen:
The main aim of this work is to extend the Modified Transverse Resonance
Technique - MTRT applications to the simetric microstrip lines structures vertically
multilayered. In order to do that, a theoretical and numerical analysis of the parameters
of these structures is performed, aiming to determine the dispersion behavior
through the knowledge about the effective dielectric constant.
To perform the theoretical analysis, multiple layers in the region around the
metallic strip are considered. This structure is denominated generalized multilayer
microstrip. Later, in numerical analysis, the generalized multilayer microstrip is particularized
to the covered microstrip, as well to other similar structures. Also, the
effect of substrate finite width on the effective permissivity is presented.
The numerical results for the effective dielectric constant are presented and
compared with the results found in the literature. Excellent concordances have been
observed. Convergence tests are realized in order to optimize the relation between the
processing time and numerical precision.
Finally, suggestions for the continuity and improvement of this work are presented.