Aplicação da técnica da ressonância transversa modificada em linhas de microfita multicamadas com segmentação vertical.

Abstract

The main aim of this work is to extend the Modified Transverse Resonance Technique - MTRT applications to the simetric microstrip lines structures vertically multilayered. In order to do that, a theoretical and numerical analysis of the parameters of these structures is performed, aiming to determine the dispersion behavior through the knowledge about the effective dielectric constant. To perform the theoretical analysis, multiple layers in the region around the metallic strip are considered. This structure is denominated generalized multilayer microstrip. Later, in numerical analysis, the generalized multilayer microstrip is particularized to the covered microstrip, as well to other similar structures. Also, the effect of substrate finite width on the effective permissivity is presented. The numerical results for the effective dielectric constant are presented and compared with the results found in the literature. Excellent concordances have been observed. Convergence tests are realized in order to optimize the relation between the processing time and numerical precision. Finally, suggestions for the continuity and improvement of this work are presented.