BATISTA NETO, L. V.; http://lattes.cnpq.br/1848896825927580; BATISTA NETO, Leopoldo Viana.
Resumen:
Titanium nitride (TiN) and titanium-zirconium nitride (TiZrN) thin films were
deposited on ASTM F 138 stainless steel substrates using de Sputtering RF methods.
Design of experiment (DOE) has long been recognized as a powerful method to
optimize a complex process in industry. The purposes of present study were to verify the
feasibility and reliability of the application of DOE method on de Sputtering RF
processes and optimize the processing parameters for the deposition process, in which
the sensitive parameters that affected the film properties were also identified. For de
Sputtering RF method, two parameters, deposition rate and time were chosen to be the
operating parameters. After deposition, the thin film structure was characterized by X-ray
diffraction (XRD), and high-resolution scanning electron microscopy (SEM). After the
polarization test, the corrosion analysis was carried out in order to investigate the
relationship between the corrosion initiation and the thickness of the deposited layer.
The analysis of variance (ANOVA) was conducted to assess the sensitive parameters
and predict the optimum conditions. Based on the statistical analysis, the most sensitive
parameters in de Sputtering RF process were both the deposition rate and time. The
optimum deposition conditions in each system were maximum deposition rate and time.